Cobalt disilicide has important applications in the field of electronics, and is widely used as a contact material in large-scale integrated circuits due to its low resistivity and good thermal stability. In addition, cobalt disilicide can also form epitaxial structures on silicon substrates for studying the interface properties of epitaxial metallic silicon. In the process of semiconductor components, it is often used to form a low resistance cobalt disilicide layer to reduce the resistance value of the components. Overall, cobalt disilicide plays an important role in electronics and semiconductor industries due to its excellent physical and chemical properties.
purity:>99.5%
Particle size: D90 < 40um
CAS: 2017-12-8
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