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Xi'an Zhiyue Material Tech. Co., Ltd.
Xi'an Zhiyue Material Tech. Co., Ltd.

High Purity Aluminum Sputtering Target (Al)

Aluminum is a silvery-white, soft, non-magnetic, ductile metal of the boron family. It is ductile. Commodities are often made into rods, sheets, foils, powders, strips and filaments. It forms an oxide film to prevent the metal from corroding in moist air.



Purity: 99.999%

CAS: 7429-90-5

  • aluminum sputtering target
  • aluminum sputtering target

Application of High Purity Aluminum Sputtering Target (Al)

1

Suitable for DC bipolar sputtering, bipolar sputtering, quaternary sputtering, RF sputtering, targeted sputtering, ion beam sputtering, magnetron sputtering, etc.

2

It can be coated with reflective film, conductive film, semiconductor film, capacitor film, decorative film, protective film, integrated circuit, display, etc.

3

Aluminum targets are relatively inexpensive and are the preferred target material while meeting the functionality of the film layer.

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