Name: High Purity Hafnium Sputtering Target (Hf)
Brand: Xi'an Zhiyue Material Tech. Co., Ltd.

Application of High Purity Hafnium Sputtering Target (Hf)

Hafnium targets are made of high-purity metal and have good thermal conductivity, mechanical strength, and chemical stability. Hafnium targets are widely used in physical evaporation deposition, magnetic control, and other technologies to prepare various thin building materials, such as oxides, nitrides, silicides, and metals.

In semiconductor manufacturing, hafnium targets are commonly used to prepare thin desert materials such as silicon, silicon nitride, alumina, and oxide. These thin materials play an important role in semiconductor devices, such as improving their stability and performance.

In display manufacturing, hafnium targets are commonly used to prepare transparent electrode materials, such as steel tin oxide (T0) and quantified zinc n0. Due to the high purity and excellent performance of hafnium targets, they play an important role in semiconductor and display manufacturing. In industrial development, the demand for hafnium targets will continue to increase.

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RM.1624. Block A. Ming Feng Bo Ma Dou, Cross of Ming Guang Road and Shang Xin Road, Xi'an Economic and Technological Development Zone, Shaanxi Province, China

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