Hafnium is a chemical element with the symbol Hf and atomic number 72. Hafnium is a lustrous, silvery-gray, tetravalent transition metal chemically similar to zirconium and is found in many zirconium minerals.
Purity: 99.95%
CAS: 7440-58-6
Hafnium targets are made of high-purity metal and have good thermal conductivity, mechanical strength, and chemical stability. Hafnium targets are widely used in physical evaporation deposition, magnetic control, and other technologies to prepare various thin building materials, such as oxides, nitrides, silicides, and metals.
In semiconductor manufacturing, hafnium targets are commonly used to prepare thin desert materials such as silicon, silicon nitride, alumina, and oxide. These thin materials play an important role in semiconductor devices, such as improving their stability and performance.
In display manufacturing, hafnium targets are commonly used to prepare transparent electrode materials, such as steel tin oxide (T0) and quantified zinc n0. Due to the high purity and excellent performance of hafnium targets, they play an important role in semiconductor and display manufacturing. In industrial development, the demand for hafnium targets will continue to increase.
Hf+Zr≥99.95%
Zr<0.5%
Fe<100ppm
We can provide various sizes of round and square targets. Round targets can have a maximum diameter of 14 inches, while square targets can also have a side length of 14 inches
Hafnium target materials are renowned for their exceptional purity, high density, and superior resistance to corrosion and radiation, making them ideal for applications in the semiconductor industry, thin film deposition, and various scientific research fields where high-performance materials are essential.
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