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Xi'an Zhiyue Material Tech. Co., Ltd.
Xi'an Zhiyue Material Tech. Co., Ltd.

High Purity Neodymium Sputtering Target (Nd)

Neodymium (Nd) sputtering targets consist of high purity neodymium metal. It has a melting point of 1021°C, a boiling point of 3074°C and a density of 7.01 g/cm3 . It is a silver-white color, oxidizes slowly in air at room temperature, and can release hydrogen by interaction with water and acid. It is paramagnetic. It exists in monazite, and is produced from aqueous neodymium chloride by dehydration and reduction with calcium metal, or from anhydrous neodymium chloride by melting and electrolysis.



Purity: 99.95%

CAS: 7440-00-8

  • neodymium sputtering target
  • neodymium sputtering target

Application of High Purity Neodymium Sputtering Target (Nd)

1

Neodymium sputtering targets can be used for photovoltaic devices and for functional coatings and more specifically utilized in thin film deposition, decoration, semiconductors, displays and LED. As for different industries, they can also be found in industries such as optical information storage, glass coating for automobiles and architectures, and optical communication.

2

It can also be used for manufacturing glass and ceramics; Neodymium magnet; Lighter burrs and steelmaking.

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