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Xi'an Zhiyue Material Tech. Co., Ltd.
Xi'an Zhiyue Material Tech. Co., Ltd.

Molybdenum Niobium Alloy Sputtering Target (MoNb)

The Molybdenum Niobium Alloy Sputtering Target (MoNb) is vital for thin-film deposition. Molybdenum niobium alloy target material is first made by uniformly mixing molybdenum powder and niobium powder, followed by pressing and sintering the powder, followed by a uniform densification process, and then processed into the target material through surface grinding and polishing.


Purity: 99.95%

  • molybdenum niobium alloy sputtering target
  • molybdenum niobium alloy sputtering target

Application of Molybdenum Niobium Alloy Sputtering Target (MoNb)

01

Semiconductor Industry: In semiconductor manufacturing, MoNb targets are utilized for thin-film deposition processes essential in the production of integrated circuits and microelectronic devices. The alloy's compatibility with semiconductor materials and its ability to create uniform thin films make it an invaluable component in the fabrication of advanced electronic components.

02

Solar Energy: In the solar energy sector, MoNb targets play a critical role in thin-film photovoltaic (PV) technologies. These targets are used to deposit layers of molybdenum niobium alloy onto substrates, forming crucial components in thin-film solar cells. The alloy's excellent electrical conductivity and stability contribute to the efficiency and durability of solar panels.

03

Corrosion Protection: Additionally, MoNb targets are employed in industries requiring corrosion-resistant coatings, such as automotive and aerospace. The alloy's superior resistance to corrosion, combined with its ability to adhere firmly to substrates, makes it an ideal choice for protecting components exposed to harsh environments.

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