Xi'an Zhiyue Material Tech. Co., Ltd.
Xi'an Zhiyue Material Tech. Co., Ltd.

Nickel Chromium Alloy Sputtering Target (Ni/Cr)

The Nickel Chromium Alloy Sputtering Target (Ni/Cr) is crucial for thin-film deposition processes. Combining nickel with chromium, this alloy provides specialized properties suitable for coating applications. Ni/Cr targets play a critical role across diverse industries, enabling the development of advanced coatings with enhanced functionalities and performance attributes.


Purity: 99.9%

Composition: Ni/Cr 80/20 wt%

  • nickel chromium alloy sputtering target
  • nickel chromium alloy sputtering target

Application of Nickel Chromium Alloy Sputtering Target (Ni/Cr)

01

Nickel chromium alloy targets are mainly used for preparing precision resistance thin films in hybrid integrated circuits, which can meet the performance requirements of sensitive thin films for resistance strain gauges. Therefore, they are commonly used for preparing thin film resistance strain gauges.

02

In the coating industry, Ni Cr binary alloy targets and films are widely used in surface strengthening films such as wear resistance, wear reduction, heat resistance, and corrosion resistance, as well as high-end technology industries such as low radiation glass, microelectronics, magnetic recording, semiconductors, and thin film resistors.

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