Name: Tungsten Titanium Alloy Sputtering Target (WTi)
Brand: Xi'an Zhiyue Material Tech. Co., Ltd.

Application of Tungsten Titanium Alloy Sputtering Target (WTi)

Semiconductor: For semiconductor applications, WTi10wt% thin film is used as a diffusion barrier layer and adhesive layer to separate the metallized layer from the semiconductor, such as separating aluminum from silicon or copper from silicon. Therefore, the functionality of semiconductors in microchips can be significantly improved.

For thin film solar cells, WTi10wt% thin film is also used as a barrier layer to prevent the diffusion of iron atoms in the steel substrate into molybdenum back contact and CIGS semiconductors. Tungsten titanium alloy targets are also used for LED and tool coatings.

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RM.1624. Block A. Ming Feng Bo Ma Dou, Cross of Ming Guang Road and Shang Xin Road, Xi'an Economic and Technological Development Zone, Shaanxi Province, China

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